1.To optimize the ESD parameters (i.e. type of precursor, type of solvent, substrate temperature, applied voltage, flow rate, nozzle-to-substrate distance) for dense BYZ and BYCZ thin films.
2. To fabricate BYZ and BYCZ thin films with thickness less than 5 m on the NiO-BYZ and NiO-BYZ anode substrates, respectively, using the ESD technique.
3. To obtain PCFC single cells (with BYZ and BYCZ thin films as electrolyte), which can operate in the intermediate temperature range (400-700 oC).
